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Revalidation of the Rayleigh resolution and DOF limitsSMITH, B. W.SPIE proceedings series. 1998, pp 142-153, isbn 0-8194-2779-9Conference Paper

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The effect of lens aberrations as a function of illumination condition on full field process windowsDAVIS, A. M; BAIR, A. E; LANTZ, B. D et al.SPIE proceedings series. 1998, pp 839-847, isbn 0-8194-2779-9Conference Paper

Three-dimensional photolithography simulator including rigorous nonplanar exposure simulation for off-axis illuminationKIRCHAUER, H; SELBERHERR, S.SPIE proceedings series. 1998, pp 764-776, isbn 0-8194-2779-9Conference Paper

Lithography of 180 nm design rule for 1Gbit DRAMDONGSEOK NAM; JUNGHYEON LEE; CHANGHWAN KIM et al.SPIE proceedings series. 1998, pp 117-123, isbn 0-8194-2779-9Conference Paper

Optimization of DUV photolithography for sub-250nm technology contact patterning with attenuated phase shift maskCHOO, L.-C; TAIN, S.-C; CHENG, A et al.SPIE proceedings series. 1998, pp 559-566, isbn 0-8194-2779-9Conference Paper

A new variable transmission illumination technique optimized with design rule criteriaCIRELLI, R. A; MKRTCHYAN, M; WATSON, G. P et al.SPIE proceedings series. 1998, pp 395-405, isbn 0-8194-2779-9Conference Paper

AF Fixer : New incremental OPC method for optimizing Assist FeatureJUNG, Sung-Gon; KIM, Sang-Wook; LUGG, Robert M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280Y.1-70280Y.6, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Absorber height effects on SWA restrictions and 'Shadow' LERMCCLINTON, Brittany M; NAULLEAU, Patrick P; WALLOW, Thomas et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969, issn 0277-786X, isbn 978-0-8194-8528-1, 796920.1-796920.12, 2Conference Paper

Improvement of KrF contact layer by inverse lithography technology with assist featureSUNGHO JUN; SHIM, Yeon-Ah; XIN ZHOU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77481V.1-77481V.9Conference Paper

Improving asymmetric printing and low margin using custom illumination for contact hole lithographyJESSEN, Scott; TERRY, Mark; MASON, Mark et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 615616.1-615616.12, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

Tolerance-based OPC and solution to MRC-constrained OPCYANG PING; XIAOHAI LI; JANG, Stephen et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732M.1-79732M.8, 2Conference Paper

Line end shortening and corner rounding for novel off-axis illumination source shapesMOH LUNG LING; GEK SOON CHUA; QUNYING LIN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72742V.1-72742V.12, 2Conference Paper

Novel assist feature design to improve depth of focus in low kl EUV lithographyKANG, Hoyoung.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 752037.1-752037.7Conference Paper

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Resolution enhancement technology: The past, the present, and extensions for the futureSCHELLENBERG, Franklin M.SPIE proceedings series. 2004, pp ix-xxviii, isbn 0-8194-5292-0Conference Paper

EUV Lithography at Chipmakers has started: Performance Validation of ASML's NXE:3100WAGNER, Christian; BACELAR, Jose; MEILING, Hans et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969, issn 0277-786X, isbn 978-0-8194-8528-1, 79691F.1-79691F.12, 2Conference Paper

Overcome the Process Limitation by using Inverse Lithography Technology with Assist FeatureSHIM, Yeon-Ah; JUN, Sungho; XIN ZHOU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732S.1-79732S.10, 2Conference Paper

Point-source approach of source-mask optimizationWEIMIN GAO; SETHI, Satyendra; DOMNENKO, Vitaliy et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7748, issn 0277-786X, isbn 0-8194-8238-2 978-0-8194-8238-9, 1Vol, 77480U.1-77480U.8Conference Paper

Process Liability evaluation for beyond 22nm Node using EUVLTAWARAYAMA, Kazuo; AOYAMA, Hajime; KOBIKI, Ayumi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7636, issn 0277-786X, isbn 978-0-8194-8050-7 0-8194-8050-9, 76361O.1-76361O.8, 2Conference Paper

Printing of structures less than 0.3um by I-line exposure using resists TDMR-AR80 und TDMR-AR95BEHRENDT, A; DOW, T; STOEFLIN, K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65193J.1-65193J.8, issn 0277-786X, isbn 978-0-8194-6638-9Conference Paper

Improving Model-Based OPC Performance for sub- 60nm devices using real source optical modelJUNG, Sunggon; KIM, In-Sung; KANG, Young-Seog et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 61561H.1-61561H.6, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

A Simple Method of Source Optimization for Advanced NAND FLASH ProcessCHANG, Yi-Shiang; OGASAWARA, Satoshi; FUJII, Koichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731Z.1-79731Z.12, 2Conference Paper

Feasibility Study of 45nm Metal Patterning with 0.93 NAYUNG FENG CHENG; YUEH LIN CHOU; YA CHING HOU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65204J.1-65204J.8, issn 0277-786X, isbn 978-0-8194-6639-6Conference Paper